RESEARCH OVERVIEW

IRG 1

IRG 2

IRG 3

RESEARCH NUGGETS

FACULTY LABS

RESEARCH OVERVIEW

The current nano-technology revolution is facing several major challenges: to manufacture nanodevices below 20 nm, to fabricate 3D complex nanostructures, and to heterogeneously integrate multiple functionalities. To tackle these grand challenges, SINAM proposes a nanomanufacturing paradigm that integrates an array of new nanomanufacturing technologies.

• IRG 1 - Focus on top-down nano-lithography, including the Plasmonic Imaging Lithography and Ultramolding Imprint Lithography, aiming toward critical resolution of 1~10nm.


• IRG 2 - Explore novel hybrid approaches, in combining the top-down and bottom-up technologies to achieve massively parallel integration of heterogeneous nanoscale components into higher-order structures and devices.


• IRG 3 - Develop system engineering strategies to scale up the technologies developed in IRG 1 and 2, and in product design and development.